Peroxidizer

Oxidant Comparison

Author(s): Daniel Alvarez, PhD

Sacrificial hardmask ALD with hydrogen peroxide: comparative study of low temperature growth and film characteristics for TiO2 and Al2O

Author(s): Dr. Daniel Alvarez, Keisuke Andachi, Gaku Tsuchibuchi, Katsumasa Suzuki, Jeff Spiegelman

Anhydrous Hydrogen Peroxide Gas Delivery for Atomic Layer Deposition

Author(s): Daniel Alvarez, Jr., Jeffrey Spiegelman

ALD of Al2O3 using H2O2 Vapor

Author(s): Adam Hinckley, Pablo Mancheno, and Anthony Muscat