Sacrificial hardmask ALD with hydrogen peroxide: comparative study of low temperature growth and film characteristics for TiO2 and Al2O

Dr. Daniel Alvarez, Keisuke Andachi, Gaku Tsuchibuchi, Katsumasa Suzuki, Jeff Spiegelman

Get full report

Products:
,

Applications:

Films:
,

Back to all Resources

All Resources

February 2020

Get the Full Research Report

Fill out the form below to request the full PDF of this report.

Resource Request

This field is for validation purposes and should be left unchanged.
Name(Required)
Scroll to Top