Brute Peroxide

BRUTE® Peroxide is more reactive than water vapor or ozone

RASIRC BRUTE Peroxide Benefits

• Provides H₂O₂ gas with minimal water
• Differentiates between H₂O₂ and water in process reactions
• Reacts faster and at lower temperatures than water
• Removes carbon and hydroxylates interface surfaces
• Improves compatibility with metal surfaces—less aggressive oxidant than ozone or O₂ Plasma
• Superior penetration into 3D high aspect ratio microstructures
• Allows high concentration H₂O₂ delivery into vacuum and low pressure applications
• Increases interface hydroxyl density on Si, Ge and SiGe films
• Enables in situ cleaning without liquid
• Proprietary delivery process, ensuring higher purity

Introducing BRUTE^® Peroxide

Water-Free Hydrogen Peroxide Gas

BRUTE Peroxide delivers virtually water-free Hydrogen Peroxide (H2O2) gas to process. This liquid solution of hydrogen peroxide and a proprietary solvent come pre-loaded in a RASIRC vaporizer. Hydrogen peroxide gas has a rapid and straightforward reaction path, making it superior to other oxidation methods.

BRUTE Peroxide Beats Traditional Vaporizers and Passivation Technology

• BRUTE Peroxide delivers high concentration H2O2 gas. No other commercial technology can deliver ultra-dry hydrogen peroxide gas.
• Plasma technology requires line of sight not possible in high aspect ratio devices
• Ozone gas can burn and damage surfaces
• Bubblers deliver less than 1% hydrogen peroxide gas by volume
• Flash vaporizers create hydrogen peroxide droplets that lead to particle formation on surfacesannealing at 300C. A thermodynamically stable, thin, uniform, high quality interlayer dielectric results.