TiO2

Mar 2020

Advantages of Hydrogen Peroxide in Spacer and Hard Mask ALD

Author(s): Daniel Alvarez, PhD

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Feb 2020

Sacrificial hardmask ALD with hydrogen peroxide: comparative study of low temperature growth and film characteristics for TiO2 and Al2O

Author(s): Dr. Daniel Alvarez, Keisuke Andachi, Gaku Tsuchibuchi, Katsumasa Suzuki, Jeff Spiegelman

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Films
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