ALD (Oxide/Nitride)
Oct 2020
Comparative Study of Titanium Nitride ALD using High Purity Hydrazine vs Ammonia
Author(s): Daniel Alvarez, PhD
Products
Brute Hydrazine
Applications
ALD (Oxide/Nitride)
Jun 2020
Deposition of High Thermal Conductivity AlN Heat Spreader Films
Author(s): Scott T. Ueda, Aaron McLeod, Michelle Chen, Chris Perez, Eric Pop, Dan Alvarez, Andrew C. Kummel
Jun 2020
Investigation of Low Temperature Silicon Nitride Deposition using Hexachlorodisilane and Ultra-High Purity Hydrazine
Author(s): Antonio T. Lucero, Aswin Kondusamy, Su Min Hwang, Xin Meng, Harrison S. Kim, Dan Alvarez Jr., Jeff Spiegelman, and Jiyoung Kim
Jun 2020
Low Temperature Crystalline AlN ALD with Hydrazine
Author(s): Professor Andrew C. Kummel (UCSD)
Jun 2020
Oxidant Comparison
Author(s): Daniel Alvarez, PhD
Jun 2020
ALD TiN Evaluation Using BRUTE Hydrazine
Author(s): Electronics Technology Dept., Tsukuba Laboratories, Research & Development Div., RASIRC and Taiyo Nippon Sanso
Jun 2020
Rasirc Brute Hydrazine versus Ammonia for III-V Nitride Deposition
Author(s): Daniel Alvarez, PhD
Jun 2020
Mar 2020
Advantages of Hydrogen Peroxide in Spacer and Hard Mask ALD
Author(s): Daniel Alvarez, PhD
Feb 2020
Sacrificial hardmask ALD with hydrogen peroxide: comparative study of low temperature growth and film characteristics for TiO2 and Al2O
Author(s): Dr. Daniel Alvarez, Keisuke Andachi, Gaku Tsuchibuchi, Katsumasa Suzuki, Jeff Spiegelman
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