RASIRC Expands Nitride Hub Program to California with New Facility at UC San Diego Qualcomm Institute
RASIRC is proud to announce a major expansion of its rapidly adopted Nitride Hub program to California. Building on the
Uncategorized
Uncategorized
RASIRC Names Rob Torres as CEO to Lead the Company’s Continued Growth and Innovation
We are pleased to announce that Rob Torres has joined RASIRC as our CEO! Rob brings more than 30 years
Uncategorized
RASIRC Breaks Ground on New BRUTE Hydrazine Production Facility in Imperial Valley
View the groundbreaking on LinkedIn to watch the video here. RASIRC, the leading provider of ultra-high-purity gas generation and chemical
BRUTE Peroxide, Peroxidizer
Improved Surface Functionalization with H₂O₂
RASIRC® has released new research on advanced surface functionalization using high-purity hydrogen peroxide (H₂O₂) delivered via BRUTE® Peroxide and Peroxidizer™
Uncategorized
RASIRC Announces CEO Transition: Jeff Spiegelman Retires, Marshall Benham Appointed as New CEO
After two decades of visionary leadership, Jeff Spiegelman, Founder and CEO of RASIRC, is announcing his retirement. His dedication and
Uncategorized
Enabling Low-Resistivity, Halogen-Free TiN Films in Advanced Nodes with BRUTE® Hydrazine
RASIRC®, in collaboration with the Kummel Lab at UC San Diego, has released groundbreaking research on low-temperature thermal TiN deposition
Uncategorized
Advanced Approach in Engineering the Interface of Metal/High-k Oxide Stacks for Next-Generation DRAM Applications
RASIRC, in collaboration with UT Dallas, presents groundbreaking research on engineering metal/high-k oxide interfaces for next-generation DRAM applications. This white
Uncategorized
BRUTE® Hydrazine Enables High Purity SiN Thermal ALD Below 400°C at the Nitride Hub
RASIRC is proud to share the recent discoveries to come out of the Nitride Hub. Through the use of BRUTE®
Uncategorized
RASIRC Granted New Patent for Removal of Ashable Hard Mask via a Hydrogen Peroxide Plasma Etch Process
RASIRC has been granted a new patent for the removal of ashable hard masks via a hydrogen peroxide plasma etch
Uncategorized
RASIRC Launches Nitride Hub for Metal Nitride Film Development
RASIRC introduces the Nitride Hub, a dedicated facility for rapid screening of metal nitride precursors in semiconductor manufacturing. This new