ALD (Oxide/Nitride)
Low Resistance ALD TiNx from Low Temperature Thermal TiCl4 + Anhydrous N2H4
Author(s): Steven Wolf, M. Kavrik, S. Ueda, M. Breeden1 J. Park, R. Holmes, Daniel Alvarez, Jeffrey Spiegelman, and Andrew C. Kummel
Low temperature ALD of SiNx in trench structure: Comparing hollow cathode plasma-enhanced ALD and thermal ALD with hydrazine
Author(s): Aswin L.N. Kondusamy, Su Min Hwang, Zhiyang Qin, Antonio T. Lucero, Xin Meng, Harrison S. Kim, Jaebeom Lee, Dan Alvarez Jr., Jeff Spiegelman, Jiyoung Kim
Low temperature Aluminium Nitride Deposition: Comparing Hydrazine and Ammonia
Author(s): Aswin L.N. Kondusamy, Su Min Hwang, Zhiyang Qin, Antonio T. Lucero, Xin Meng, Dan Alvarez Jr., Jeff Spiegelman, Jiyoung Kim
AF2-MoP16 ALD HfO2 with Anhydrous H2O2 in a 300 mm Cross-flow Reactor – Comparison with H2O and O3 Oxidants
Author(s): Steven Consiglio, R. Clark, C. Wajda, G. Leusink
Low Temperature ALD of SiNx using Si2Cl6 and ultra high-purity Hydrazine
Author(s): Aswin L.N. Kondusamy, Antonio T. Lucero, Su Min Hwang, Xin Meng, Harrison S. Kim, Jaebeom Lee, Dan Alvarez Jr., Jeff Spiegelman, Jiyoung Kim
Low Temperature Atomic Layer Deposition of Silicon Nitride using Hexachlorodisilane and Ultra-High Purity Hydrazine
Author(s): Aswin L. N. Kondusamy, Antonio T. Lucero, Su Min Hwang, Xin Meng, Harrison S. Kim, Dan Alvarez Jr., Jeff Spiegelman, and Jiyoung Kim
Low-T Thermal ALD BN from N2H4 + BCI3 on SI0.7Ge0.3(001), HPOG, and Cu
Author(s): Steven Wolf, M. Breeden, M. Edmonds, K
Low temperature thermal SiNx ALD process using N2H4
Author(s): Jae Chan Park, Dae Hyun Kim, Tae Jun Seok, Dae Woong Kim, Woo-Hee Kim and Tae Joo Park
Low Temperature Thermal ALD TiNx and TaNx Films from Anhydrous N2H4
Author(s): Steven Wolf, Michael Breeden, Mahmut Kavrik, Jun Hong Park, Russell Holmes, Daniel Alvarez, Jeffrey Spiegelman, and Andrew C. Kummel
Low temperature thermal ALD of a SiNx interfacial diffusion barrier and interface passivation layer on SixGe1- x(001) and SixGe1- x(110)
Author(s): Mary Edmonds, Kasra Sardashti, Steven Wolf, Evgueni Chagarov, Max Clemons, Tyler Kent, Jun Hong Park, Kechao Tang, Paul C. McIntyre, Naomi Yoshida, Lin Dong, Russell Holmes, Daniel Alvarez, and Andrew C. Kummel
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