Low temperature thermal SiNx ALD process using N2H4

Jae Chan Park, Dae Hyun Kim, Tae Jun Seok, Dae Woong Kim, Woo-Hee Kim and Tae Joo Park

Get full report

Products:

Applications:

Films:

Back to all Resources

All Resources

June 2018

Get the Full Research Report

Fill out the form below to request the full PDF of this report.

Resource Request

This field is for validation purposes and should be left unchanged.
Name(Required)
Scroll to Top