Passivation and Functionalization of SiGe(001) and (110) via HOOH(g) Dosing for ALD Nucleation
Sang Wook Park, Tobin Kaufman-Osborn, Hyonwoong Kim, Evgueni Chagarov, Bhagawan Sahu, Andrew C. Kummel
June 2014
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Products:
Brute Peroxide
Applications:
ALD (Oxide/Nitride), Surface Clean / Modification
Films:
SiGe