Atomic imaging and modeling of passivation, functionalization, and atomic layer deposition nucleation of the SiGe(001) surface via H2O2(g) and trimethylaluminum dosing
Tobin Kaufman-Osborn, Evgueni A. Chagarov, SangWook Park, Bhagawan Sahuc, Shariq Siddiqui, Andrew C. Kummel
June 2014
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Products:
Brute Peroxide
Applications:
ALD (Oxide/Nitride), Surface Clean / Modification
Films:
SiGe