RASIRC
White Papers/
Technical Presentations
Research results and technical details
Comparative Study of Titanium Nitride ALD using High Purity Hydrazine vs Ammonia
Daniel Alvarez, PhD
HYDRAZINE
OCTOBER 2020
Low Temperature Crystalline AlN ALD with Hydrazine
Professor Andrew C. Kummel (UCSD)
HYDRAZINE
JUNE 2020
Advantages of Hydrogen Peroxide in Spacer and Hard Mask ALD
Daniel Alvarez, PhD
PEROXIDIZER
MARCH 2020
Hydrogen Peroxide Gas Delivery for Atomic Layer Deposition, Annealing, and Surface Cleaning in Semiconductor Processing
Jeffrey Spiegelman, Russ Holmes and Zohreh Shamsi
PEROXIDIZER
JUNE 2016
Anhydrous Hydrogen Peroxide Gas Delivery for Atomic Layer Deposition
Daniel Alvarez, Jr., Jeffrey Spiegelman
BRUTE PEROXIDE
FEBRUARY 2016
Low temperature Aluminium Nitride Deposition: Comparing Hydrazine and Ammonia
Aswin L.N. Kondusamy, Su Min Hwang, Zhiyang Qin, Antonio T. Lucero, Xin Meng, Dan Alvarez Jr., Jeff Spiegelman, Jiyoung Kim
HYDRAZINE
2019
Particle Generation by Incomplete Vaporization of Condensable Fluids and Particle Prevention by Membrane Pervaporation
Jeffrey Spiegelman, Daniel Alvarez, Russ Holmes
RAINMAKER HUMIDIFICATION SYSTEM (RHS)
JUNE 2016
Process Variables Affecting Silicon Oxide Films Related to Wet Thermal Oxidation
Jeffrey Spiegelman
RAINMAKER HUMIDIFICATION SYSTEM (RHS)
MAY 2008
Thermal Oxidation as a Key Technology for High Efficiency Screen Printed Industrial Silicon Solar Cells
Daniel Biro, Sebastian Mack, Andreas Wolf, Anke Lemke, Udo Belledin, Denis Erath, Benedikt Holzinger, Edgar Allan Wotke, Marc Hofmann, Luca Gautero, Jochen Rentsch, Ralf Preu
JUNE 2009
Low temperature thermal SiNx ALD process using N2H4
Jae Chan Park, Dae Hyun Kim, Tae Jun Seok, Dae Woong Kim, Woo-Hee Kim and Tae Joo Park
HYDRAZINE
2018
Low-T Thermal ALD BN from N2H4 + BCI3 on SI0.7Ge0.3(001), HPOG, and Cu
Steven Wolf, M. Breeden, M. Edmonds, K
HYDRAZINE
2018
AS-TuP4 Investigation of In-situ Surface Cleaning of Cu Films using O3/O2 and N2H4
Su Min Hwang, A.L.N. Kondusamy, Q. Zhiyang, H.S. Kim, L.F. Pe±a, K. Tan, J. Veyan, Daniel Alvarez, Jeffrey Spiegelman, Jiyoung Kim
HYDRAZINE
2019
Investigation of Low Temperature Silicon Nitride Deposition using Hexachlorodisilane and Ultra-High Purity Hydrazine
Antonio T. Lucero, Aswin Kondusamy, Su Min Hwang, Xin Meng, Harrison S. Kim, Dan Alvarez Jr., Jeff Spiegelman, and Jiyoung Kim
HYDRAZINE
2020
Low Temperature Thermal ALD TiNx and TaNx Films from Anhydrous N2H4
Steven Wolf, Michael Breeden, Mahmut Kavrik, Jun Hong Park, Russell Holmes, Daniel Alvarez, Jeffrey Spiegelman, and Andrew C. Kummel
HYDRAZINE
2018
Low temperature thermal ALD of a SiNx interfacial diffusion barrier and interface passivation layer on SixGe1- x(001) and SixGe1- x(110)
Mary Edmonds, Kasra Sardashti, Steven Wolf, Evgueni Chagarov, Max Clemons, Tyler Kent, Jun Hong Park, Kechao Tang, Paul C. McIntyre, Naomi Yoshida, Lin Dong, Russell Holmes, Daniel Alvarez, and Andrew C. Kummel
HYDRAZINE
2017
DFT Molecular Dynamics Simulations and Experimental Measurements of a-HfO2/a-SiO/SiGe(001) and a-HfO2/a-SiO2/SiGe(001) Interfaces
E. Chagarov, K. Sardashti, I. Kwak, S. Ueda, Andrew C. Kummel, M. Yakimov, S. Oktyabrsky, N. Yoshida, L. Dong. N. Kim, S. Nemani, Daniel Alvarez, Jeffrey Spiegelman
BRUTE PEROXIDE, PEROXIDIZER
2016
Comparison of hydrogen peroxide and ozone for use in zirconium oxide atomic layer deposition
Daniel Alvarez, Jeffrey Spiegelman
BRUTE PEROXIDE, PEROXIDIZER
2019
Self-limiting CVD of a passivating SiOx control layer on InGaAs(001)-(2×4) with the prevention of III-V oxidation
Mary Edmonds, Steven Wolf, Evgueni Chagarov, Tyler Kent, Jun Hong Park, Russell Holmes, Daniel Alvarez, Ravi Droopad, Andrew C. Kummel
BRUTE PEROXIDE, PEROXIDIZER
2017
Vapor-phase Surface Cleaning of Electroplated Cu Films Using Anhydrous N2H4
Su Min Hwang, Luis Fabißn Pe±a, Kui Tan, Harrison Sejoon Kim, Aswin L. N. Kondusamy, Zhiyang Qin, Yong Chan Jung, Jean-Francois Veyan, Daniel Alvarez, Jeff Spiegelman, and Jiyoung Kim
HYDRAZINE
2019
Cleaning and passivation of Copper Surface using acetic acid, hydrazine and self-assembled monolayers
Su Min Hwang, Harrison Sejoon Kim, Jin-Hyun Kim, Yong Chan Jung, Luis Fabißn Pe±a, Kui Tan, Jean-Francois Veyan, Daniel Alvarez, Jeff Spiegelman, Dennis M. Hausmann, Kashish Sharma, Paul Lemaire, and Jiyoung Kim
HYDRAZINE
2019
Low Resistance ALD TiNx from Low Temperature Thermal TiCl4 + Anhydrous N2H4
Steven Wolf, M. Kavrik, S. Ueda, M. Breeden1 J. Park, R. Holmes, Daniel Alvarez, Jeffrey Spiegelman, and Andrew C. Kummel
HYDRAZINE
2019
RASIRC BRUTE Hydrazine versus Ammonia for III-V Nitride Deposition
Daniel Alvarez, PhD
HYDRAZINE
JUNE 2020
BRUTE Hydrazine for Low Temperature Metal-Nitride ALD: Low Resistivity and Oxygen-Free Films Enabled by Ultra-High Purity
Daniel Alvarez and Jeffrey Spiegelman
BRUTE HYDRAZINE
2017
Decomposition of Hydrogen Peroxide in the Gas Phase
Jeff Spiegelman
HYDROGEN PEROXIDE
MARCH 2019
Sacrificial hardmask ALD with hydrogen peroxide: comparative study of low temperature growth and film characteristics for TiO2 and Al2O
Dr. Daniel Alvarez, Keisuke Andachi, Gaku Tsuchibuchi, Katsumasa Suzuki, Jeff Spiegelman
PEROXIDIZER
FEBRUARY 2020
Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor
Daniel Alvarez and Jeffrey Spiegelman
HYDROGEN PEROXIDE
JAN/FEB 2015
RainMaker Humidification System for Precise Delivery of Water Vapor into Atmospheric and Vacuum Application
Jeffrey Spiegelman
RAINMAKER HUMIDIFICATION SYSTEM (RHS)
MAY 2008
Control and Optimization of Thermal Oxidation Processes for Industrial Solar Cell Fabrication
Sebastian Mack, Anke Lemke, Andreas Wolf, Benedikt Holzinger, Martin Zimmer, Daniel Biro, Ralf Preu
JUNE 2009
ALD TiN Evaluation Using BRUTE Hydrazine
Electronics Technology Dept., Tsukuba Laboratories, Research & Development Div., RASIRC and Taiyo Nippon Sanso
HYDRAZINE
2020
AF2-MoP16 ALD HfO2 with Anhydrous H2O2 in a 300 mm Cross-flow Reactor û Comparison with H2O and O3 Oxidants
Steven Consiglio, R. Clark, C. Wajda, G. Leusink
BRUTE PEROXIDE, PEROXIDIZER
2019
Deposition of High Thermal Conductivity AlN Heat Spreader Films
Scott T. Ueda, Aaron McLeod, Michelle Chen, Chris Perez, Eric Pop, Dan Alvarez, Andrew C. Kummel
HYDRAZINE
2020
Low Temperature Atomic Layer Deposition of Silicon Nitride using Hexachlorodisilane and Ultra-High Purity Hydrazine
Aswin L. N. Kondusamy, Antonio T. Lucero, Su Min Hwang, Xin Meng, Harrison S. Kim, Dan Alvarez Jr., Jeff Spiegelman, and Jiyoung Kim
HYDRAZINE
2018
Passivation and Functionalization of SiGe(001) and (110) via HOOH(g) Dosing for ALD Nucleation
Sang Wook Park, Tobin Kaufman-Osborn, Hyonwoong Kim, Evgueni Chagarov, Bhagawan Sahu, Andrew C. Kummel
BRUTE PEROXIDE, PEROXIDIZER
2014
Atomic imaging and modeling of passivation, functionalization, and atomic layer deposition nucleation of the SiGe(001) surface via H2O2(g) and trimethylaluminum dosing
Tobin Kaufman-Osborn, Evgueni A. Chagarov, SangWook Park, Bhagawan Sahuc, Shariq Siddiqui, Andrew C. Kummel
BRUTE PEROXIDE, PEROXIDIZER
2014
Anhydrous H2O2 for ALD HfO2 growth and interfacial layer thickness control
S. Consiglio, R. D. Clark, T. Hakamata, K. Tapily. C. S. Wajda, and G. J. Leusink
HYDRAZINE
2016
Low temperature ALD of SiNx in trench structure: Comparing hollow cathode plasma-enhanced ALD and thermal ALD with hydrazine
Aswin L.N. Kondusamy, Su Min Hwang, Zhiyang Qin, Antonio T. Lucero, Xin Meng, Harrison S. Kim, Jaebeom Lee, Dan Alvarez Jr., Jeff Spiegelman, Jiyoung Kim
HYDRAZINE
2019
Effect of Vapor-phase Cleaning Using Anhydrous N2H4 on Cu and Co for Area-Selective Atomic Layer Deposition
Jin-Hyun Kim,a,b Sang Woo Kim, Su Min Hwang, Harrison Sejoon Kim, Yong Chan Jung, Luis Fabißn Pe±a, Kui Tan, Jean-Francois Veyan, Rino Choi, Daniel Alvarez, Jeff Spiegelman, and Jiyoung Kim
HYDRAZINE
2020
Nafion-based Drying Apparatuses for Humidity Removal from Sample Gas Prior to GC/MS Analysis
Christopher Rosemeyer, Russel J. Holmes, Daniel Alvarez, Jr., Jeffrey Spiegelman
SEP/OCT 2013
View the News and Views Archive
RASIRC products generate and deliver water vapor, hydrogen peroxide and hydrazine gas in controlled, repeatable concentrations to critical processes.
Social Profiles
© Copyright 2021 RASIRC – All Rights Reserved – Privacy Statement
Comparative Study of Titanium Nitride ALD using High Purity Hydrazine vs Ammonia
Daniel Alvarez, PhD
HYDRAZINE
OCTOBER 2020
Low Temperature Crystalline AlN ALD with Hydrazine
Professor Andrew C. Kummel (UCSD)
HYDRAZINE
JUNE 2020
Advantages of Hydrogen Peroxide in Spacer and Hard Mask ALD
Daniel Alvarez, PhD
PEROXIDIZER
MARCH 2020
Hydrogen Peroxide Gas Delivery for Atomic Layer Deposition, Annealing, and Surface Cleaning in Semiconductor Processing
Jeffrey Spiegelman, Russ Holmes and Zohreh Shamsi
PEROXIDIZER
JUNE 2016
Anhydrous Hydrogen Peroxide Gas Delivery for Atomic Layer Deposition
Daniel Alvarez, Jr., Jeffrey Spiegelman
BRUTE PEROXIDE
FEBRUARY 2016
Low temperature Aluminium Nitride Deposition: Comparing Hydrazine and Ammonia
Aswin L.N. Kondusamy, Su Min Hwang, Zhiyang Qin, Antonio T. Lucero, Xin Meng, Dan Alvarez Jr., Jeff Spiegelman, Jiyoung Kim
HYDRAZINE
2019
Particle Generation by Incomplete Vaporization of Condensable Fluids and Particle Prevention by Membrane Pervaporation
Jeffrey Spiegelman, Daniel Alvarez, Russ Holmes
RAINMAKER HUMIDIFICATION SYSTEM (RHS)
JUNE 2016
Process Variables Affecting Silicon Oxide Films Related to Wet Thermal Oxidation
Jeffrey Spiegelman
RAINMAKER HUMIDIFICATION SYSTEM (RHS)
MAY 2008
Thermal Oxidation as a Key Technology for High Efficiency Screen Printed Industrial Silicon Solar Cells
Daniel Biro, Sebastian Mack, Andreas Wolf, Anke Lemke, Udo Belledin, Denis Erath, Benedikt Holzinger, Edgar Allan Wotke, Marc Hofmann, Luca Gautero, Jochen Rentsch, Ralf Preu
JUNE 2009
Low temperature thermal SiNx ALD process using N2H4
Jae Chan Park, Dae Hyun Kim, Tae Jun Seok, Dae Woong Kim, Woo-Hee Kim and Tae Joo Park
HYDRAZINE
2018
Low-T Thermal ALD BN from N2H4 + BCI3 on SI0.7Ge0.3(001), HPOG, and Cu
Steven Wolf, M. Breeden, M. Edmonds, K
HYDRAZINE
2018
AS-TuP4 Investigation of In-situ Surface Cleaning of Cu Films using O3/O2 and N2H4
Su Min Hwang, A.L.N. Kondusamy, Q. Zhiyang, H.S. Kim, L.F. Pe±a, K. Tan, J. Veyan, Daniel Alvarez, Jeffrey Spiegelman, Jiyoung Kim
HYDRAZINE
2019
Investigation of Low Temperature Silicon Nitride Deposition using Hexachlorodisilane and Ultra-High Purity Hydrazine
Antonio T. Lucero, Aswin Kondusamy, Su Min Hwang, Xin Meng, Harrison S. Kim, Dan Alvarez Jr., Jeff Spiegelman, and Jiyoung Kim
HYDRAZINE
2020
Low Temperature Thermal ALD TiNx and TaNx Films from Anhydrous N2H4
Steven Wolf, Michael Breeden, Mahmut Kavrik, Jun Hong Park, Russell Holmes, Daniel Alvarez, Jeffrey Spiegelman, and Andrew C. Kummel
HYDRAZINE
2018
Low temperature thermal ALD of a SiNx interfacial diffusion barrier and interface passivation layer on SixGe1- x(001) and SixGe1- x(110)
Mary Edmonds, Kasra Sardashti, Steven Wolf, Evgueni Chagarov, Max Clemons, Tyler Kent, Jun Hong Park, Kechao Tang, Paul C. McIntyre, Naomi Yoshida, Lin Dong, Russell Holmes, Daniel Alvarez, and Andrew C. Kummel
HYDRAZINE
2017
DFT Molecular Dynamics Simulations and Experimental Measurements of a-HfO2/a-SiO/SiGe(001) and a-HfO2/a-SiO2/SiGe(001) Interfaces
E. Chagarov, K. Sardashti, I. Kwak, S. Ueda, Andrew C. Kummel, M. Yakimov, S. Oktyabrsky, N. Yoshida, L. Dong. N. Kim, S. Nemani, Daniel Alvarez, Jeffrey Spiegelman
BRUTE PEROXIDE, PEROXIDIZER
2016
Comparison of hydrogen peroxide and ozone for use in zirconium oxide atomic layer deposition
Daniel Alvarez, Jeffrey Spiegelman
BRUTE PEROXIDE, PEROXIDIZER
2019
Self-limiting CVD of a passivating SiOx control layer on InGaAs(001)-(2×4) with the prevention of III-V oxidation
Mary Edmonds, Steven Wolf, Evgueni Chagarov, Tyler Kent, Jun Hong Park, Russell Holmes, Daniel Alvarez, Ravi Droopad, Andrew C. Kummel
BRUTE PEROXIDE, PEROXIDIZER
2017
Vapor-phase Surface Cleaning of Electroplated Cu Films Using Anhydrous N2H4
Su Min Hwang, Luis Fabißn Pe±a, Kui Tan, Harrison Sejoon Kim, Aswin L. N. Kondusamy, Zhiyang Qin, Yong Chan Jung, Jean-Francois Veyan, Daniel Alvarez, Jeff Spiegelman, and Jiyoung Kim
HYDRAZINE
2019
Cleaning and passivation of Copper Surface using acetic acid, hydrazine and self-assembled monolayers
Su Min Hwang, Harrison Sejoon Kim, Jin-Hyun Kim, Yong Chan Jung, Luis Fabißn Pe±a, Kui Tan, Jean-Francois Veyan, Daniel Alvarez, Jeff Spiegelman, Dennis M. Hausmann, Kashish Sharma, Paul Lemaire, and Jiyoung Kim
HYDRAZINE
2019
Low Resistance ALD TiNx from Low Temperature Thermal TiCl4 + Anhydrous N2H4
Steven Wolf, M. Kavrik, S. Ueda, M. Breeden1 J. Park, R. Holmes, Daniel Alvarez, Jeffrey Spiegelman, and Andrew C. Kummel
HYDRAZINE
2019
RASIRC BRUTE Hydrazine versus Ammonia for III-V Nitride Deposition
Daniel Alvarez, PhD
HYDRAZINE
JUNE 2020
BRUTE Hydrazine for Low Temperature Metal-Nitride ALD: Low Resistivity and Oxygen-Free Films Enabled by Ultra-High Purity
Daniel Alvarez and Jeffrey Spiegelman
BRUTE HYDRAZINE
2017
Decomposition of Hydrogen Peroxide in the Gas Phase
Jeff Spiegelman
HYDROGEN PEROXIDE
MARCH 2019
Sacrificial hardmask ALD with hydrogen peroxide: comparative study of low temperature growth and film characteristics for TiO2 and Al2O
Dr. Daniel Alvarez, Keisuke Andachi, Gaku Tsuchibuchi, Katsumasa Suzuki, Jeff Spiegelman
PEROXIDIZER
FEBRUARY 2020
Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor
Daniel Alvarez and Jeffrey Spiegelman
HYDROGEN PEROXIDE
JAN/FEB 2015
RainMaker Humidification System for Precise Delivery of Water Vapor into Atmospheric and Vacuum Application
Jeffrey Spiegelman
RAINMAKER HUMIDIFICATION SYSTEM (RHS)
MAY 2008
Control and Optimization of Thermal Oxidation Processes for Industrial Solar Cell Fabrication
Sebastian Mack, Anke Lemke, Andreas Wolf, Benedikt Holzinger, Martin Zimmer, Daniel Biro, Ralf Preu
JUNE 2009
ALD TiN Evaluation Using BRUTE Hydrazine
Electronics Technology Dept., Tsukuba Laboratories, Research & Development Div., RASIRC and Taiyo Nippon Sanso
HYDRAZINE
2020
AF2-MoP16 ALD HfO2 with Anhydrous H2O2 in a 300 mm Cross-flow Reactor û Comparison with H2O and O3 Oxidants
Steven Consiglio, R. Clark, C. Wajda, G. Leusink
BRUTE PEROXIDE, PEROXIDIZER
2019
Deposition of High Thermal Conductivity AlN Heat Spreader Films
Scott T. Ueda, Aaron McLeod, Michelle Chen, Chris Perez, Eric Pop, Dan Alvarez, Andrew C. Kummel
HYDRAZINE
2020
Low Temperature Atomic Layer Deposition of Silicon Nitride using Hexachlorodisilane and Ultra-High Purity Hydrazine
Aswin L. N. Kondusamy, Antonio T. Lucero, Su Min Hwang, Xin Meng, Harrison S. Kim, Dan Alvarez Jr., Jeff Spiegelman, and Jiyoung Kim
HYDRAZINE
2018
Passivation and Functionalization of SiGe(001) and (110) via HOOH(g) Dosing for ALD Nucleation
Sang Wook Park, Tobin Kaufman-Osborn, Hyonwoong Kim, Evgueni Chagarov, Bhagawan Sahu, Andrew C. Kummel
BRUTE PEROXIDE, PEROXIDIZER
2014
Atomic imaging and modeling of passivation, functionalization, and atomic layer deposition nucleation of the SiGe(001) surface via H2O2(g) and trimethylaluminum dosing
Tobin Kaufman-Osborn, Evgueni A. Chagarov, SangWook Park, Bhagawan Sahuc, Shariq Siddiqui, Andrew C. Kummel
BRUTE PEROXIDE, PEROXIDIZER
2014
Anhydrous H2O2 for ALD HfO2 growth and interfacial layer thickness control
S. Consiglio, R. D. Clark, T. Hakamata, K. Tapily. C. S. Wajda, and G. J. Leusink
HYDRAZINE
2016
Low temperature ALD of SiNx in trench structure: Comparing hollow cathode plasma-enhanced ALD and thermal ALD with hydrazine
Aswin L.N. Kondusamy, Su Min Hwang, Zhiyang Qin, Antonio T. Lucero, Xin Meng, Harrison S. Kim, Jaebeom Lee, Dan Alvarez Jr., Jeff Spiegelman, Jiyoung Kim
HYDRAZINE
2019
Effect of Vapor-phase Cleaning Using Anhydrous N2H4 on Cu and Co for Area-Selective Atomic Layer Deposition
Jin-Hyun Kim,a,b Sang Woo Kim, Su Min Hwang, Harrison Sejoon Kim, Yong Chan Jung, Luis Fabißn Pe±a, Kui Tan, Jean-Francois Veyan, Rino Choi, Daniel Alvarez, Jeff Spiegelman, and Jiyoung Kim
HYDRAZINE
2020
Nafion-based Drying Apparatuses for Humidity Removal from Sample Gas Prior to GC/MS Analysis
Christopher Rosemeyer, Russel J. Holmes, Daniel Alvarez, Jr., Jeffrey Spiegelman
SEP/OCT 2013
View the News and Views Archive
RASIRC products generate and deliver water vapor, hydrogen peroxide and hydrazine gas in controlled, repeatable concentrations to critical processes.
Social Profiles
© Copyright 2023 RASIRC – All Rights Reserved – Privacy Statement