Advantages of Hydrogen Peroxide in Spacer and Hard Mask ALD

AF2-MoP16 ALD HfO2 with Anhydrous H2O2 in a 300 mm Cross-flow Reactor – Comparison with H2O and O3 Oxidants

ALD of Al2O3 using H2O2 Vapor

ALD TiN Evaluation Using BRUTE Hydrazine

Anhydrous H2O2 for ALD HfO2 growth and interfacial layer thickness control

Anhydrous Hydrogen Peroxide Gas Delivery for Atomic Layer Deposition

AS-TuP4 Investigation of In-situ Surface Cleaning of Cu Films using O3/O2 and N2H4

Atomic imaging and modeling of passivation, functionalization, and atomic layer deposition nucleation of the SiGe(001) surface via H2O2(g) and trimethylaluminum dosing

BRUTE Hydrazine for Low Temperature Metal-Nitride ALD: Low Resistivity and Oxygen-Free Films Enabled by Ultra-High Purity

Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

Cleaning and passivation of Copper Surface using acetic acid, hydrazine and self-assembled monolayers

Comparative Study of Titanium Nitride ALD using High Purity Hydrazine vs Ammonia

Comparison of hydrogen peroxide and ozone for use in zirconium oxide atomic layer deposition

Control and Optimization of Thermal Oxidation Processes for Industrial Solar Cell Fabrication

Decomposition of Hydrogen Peroxide in the Gas Phase

Deposition of High Thermal Conductivity AlN Heat Spreader Films

DFT Molecular Dynamics Simulations and Experimental Measurements of a-HfO2/a-SiO/SiGe(001) and a-HfO2/a-SiO2/SiGe(001) Interfaces

Effect of Vapor-phase Cleaning Using Anhydrous N2H4 on Cu and Co for Area-Selective Atomic Layer Deposition

Hydrogen Peroxide Gas Delivery for Atomic Layer Deposition, Annealing, and Surface Cleaning in Semiconductor Processing

Investigation of Low Temperature Silicon Nitride Deposition using Hexachlorodisilane and Ultra-High Purity Hydrazine

Low Resistance ALD TiNx from Low Temperature Thermal TiCl4 + Anhydrous N2H4

Low temperature ALD of SiNx in trench structure: Comparing hollow cathode plasma-enhanced ALD and thermal ALD with hydrazine

Low Temperature ALD of SiNx using Si2Cl6 and ultra high-purity Hydrazine

Low temperature Aluminium Nitride Deposition: Comparing Hydrazine and Ammonia

Low Temperature Atomic Layer Deposition of Silicon Nitride using Hexachlorodisilane and Ultra-High Purity Hydrazine

Low Temperature Crystalline AlN ALD with Hydrazine

Low temperature thermal ALD of a SiNx interfacial diffusion barrier and interface passivation layer on SixGe1- x(001) and SixGe1- x(110)

Low Temperature Thermal ALD TiNx and TaNx Films from Anhydrous N2H4

Low temperature thermal SiNx ALD process using N2H4

Low-T Thermal ALD BN from N2H4 + BCI3 on SI0.7Ge0.3(001), HPOG, and Cu

Nafion-based Drying Apparatuses for Humidity Removal from Sample Gas Prior to GC/MS Analysis

Oxidant Comparison

Particle Generation by Incomplete Vaporization of Condensable Fluids and Particle Prevention by Membrane Pervaporation

Passivation and Functionalization of SiGe(001) and (110) via HOOH(g) Dosing for ALD Nucleation

Process Variables Affecting Silicon Oxide Films Related to Wet Thermal Oxidation

RainMaker Humidification System for Precise Delivery of Water Vapor into Atmospheric and Vacuum Application

RASIRC BRUTE Hydrazine versus Ammonia for III-V Nitride Deposition

Sacrificial hardmask ALD with hydrogen peroxide: comparative study of low temperature growth and film characteristics for TiO2 and Al2O

Self-limiting CVD of a passivating SiOx control layer on InGaAs(001)-(2×4) with the prevention of III-V oxidation

Thermal Oxidation as a Key Technology for High Efficiency Screen Printed Industrial Silicon Solar Cells

Vapor-phase Surface Cleaning of Electroplated Cu Films Using Anhydrous N2H4

ALD Nitride Wizard – White Paper