After two decades of visionary leadership, Jeff Spiegelman, Founder and CEO of RASIRC, is announcing his retirement. His dedication and […]
RASIRC®, in collaboration with the Kummel Lab at UC San Diego, has released groundbreaking research on low-temperature thermal TiN deposition
RASIRC, in collaboration with UT Dallas, presents groundbreaking research on engineering metal/high-k oxide interfaces for next-generation DRAM applications. This white
RASIRC is proud to share the recent discoveries to come out of the Nitride Hub. Through the use of BRUTE®
RASIRC has been granted a new patent for the removal of ashable hard masks via a hydrogen peroxide plasma etch
RASIRC introduces the Nitride Hub, a dedicated facility for rapid screening of metal nitride precursors in semiconductor manufacturing. This new
RASIRC has partnered with Taiyo Nippon Sanso Corporation (TNSC) to bring BRUTE Peroxide to the Japanese market. This canister-based hydrogen
