ALD (Oxide/Nitride)

Aug 2024

Improved Crystallinity and Polarity Determination of Gallium Nitride on Si (111) Using Atomic Layer Annealing

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Aug 2024

In-situ FTIR Study of Oxygen source mixing for Hafnium Oxide Atomic Layer Deposition on Titanium Nitride

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Aug 2024

Atomic Layer Deposition of Nb2O5 using TBTEA-Nb and anhydrous H2O2 for Ferroelectric HfO2 Application

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Jun 2024

BEOL Compatible Ultra-Low Operating Voltage (0.5V) and Preconfigured Switching Polarization States Effective 3nm Ferroelectric HZO Capacitors

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Jun 2024

Selective Co metal ALD on Cu with Cyclic Hydrogen Peroxide and Hydrazine clean enables improved yield for Inverse Hybrid Metal Bonding application

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Jun 2024

Selective Co ALD for Chiplet-to-Wafer and Wafer to Wafer Bonding

Author(s): IITC Interconnect 2024 (San Jose)

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Jun 2024

Atomic Layer Deposition of TiN in Horizontal Vias Using Hydrazine as Nitrogen Precursor

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Apr 2024

Inhibitor Free Area Selective Atomic Layer Deposition (AS-ALD) of dielectric materials on Cu surface for Interconnect applications

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Apr 2024

Vapor Phase surface cleaning of Cobalt for novel interconnect applications

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Jul 2023

The Effects of in-situ Atomic Layer Annealing on Thermal Atomic Layer Deposited Silicon Nitride

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