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Convert low vapor-pressure liquid into gas

Enabling next generation semiconductor processes

Latest News

Improved Surface Functionalization with H₂O₂

May 30, 2025

RASIRC® has released new research on advanced surface functionalization using high-purity hydrogen peroxide (H₂O₂) delivered via BRUTE® Peroxide and Peroxidizer™ technology. The study demonstrates that H₂O₂ enables 4–5x greater OH...

RASIRC Announces CEO Transition: Jeff Spiegelman Retires, Marshall Benham Appointed as New CEO

May 2, 2025

After two decades of visionary leadership, Jeff Spiegelman, Founder and CEO of RASIRC, is announcing his retirement. His dedication and innovative drive have been central to RASIRC's growth and success,...

Enabling Low-Resistivity, Halogen-Free TiN Films in Advanced Nodes with BRUTE® Hydrazine

April 11, 2025

RASIRC®, in collaboration with the Kummel Lab at UC San Diego, has released groundbreaking research on low-temperature thermal TiN deposition using anhydrous BRUTE® Hydrazine. The study demonstrates that BRUTE® Hydrazine...

RASIRC enables new process innovation with specialty gas generation

RASIRC products convert low vapor-pressure liquid chemistries into safer, reliable gases. These highly reactive chemistries generate thin oxide and nitride films at reduced temperatures for complex 3D structures in advanced microprocessors, memory, and III-V devices.

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Our Products

BRUTE Hydrazine, produced by RASIRC

BRUTE® Hydrazine

BRUTE Hydrazine converts liquid hydrazine into pure, dry hydrazine gas. BRUTE Hydrazine is highly effective source for surface reduction and growth of low temperature nitride ALD and MOCVD. Commercial applications include titanium nitride, silicon nitride and aluminum nitride. BRUTE Hydrazine generates ultra-thin films with low resistivity and minimal oxygen contamination.

BRUTE Peroxide, produced by RASIRC

BRUTE® Peroxide

BRUTE Peroxide is an alternative to ozone and water in ALD applications requiring low-temperature, high-quality oxide films. It can also replace O2 plasma for surface preparation in wafer bonding, specialty coatings, and area selective deposition.

Peroxidizer - a white rectangular product designed by RASIRC

Peroxidizer®

The Peroxidizer continuously converts liquid hydrogen peroxide into hydrogen peroxide gas. H2O2 gas has a myriad of applications for next generation devices. The Peroxidizer can be used for gapfill cure, anneal, atomic layer deposition, PR/ARC pre-treatment and more. For high flows of hydrogen peroxide gas, the Peroxidizer is cost effective for HVM applications.

Upcoming Events

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International ALD/ALE

June 22-25, 2025

Jeju Island, South Korea

RASIRC will be attending the International ALD/ALE conference in Jeju Island, South Korea. Learn more about it.

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About RASIRC

Founded in 2005, RASIRC uses proprietary technology to generate high purity vapor from liquid sources. ISO 9001-2008 certified, RASIRC develops and manufactures products in California and Colorado targeted at low temperature surface modification and thin film growth.