Convert low vapor-pressure liquid into gas
Enabling next generation semiconductor processes
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RASIRC enables new process innovation with specialty gas generation
RASIRC products convert low vapor-pressure liquid chemistries into safer, reliable gases. These highly reactive chemistries generate thin oxide and nitride films at reduced temperatures for complex 3D structures in advanced microprocessors, memory, and III-V devices.
Our Products
BRUTE® Hydrazine
BRUTE Hydrazine converts liquid hydrazine into pure, dry hydrazine gas. BRUTE Hydrazine is highly effective source for surface reduction and growth of low temperature nitride ALD and MOCVD. Commercial applications include titanium nitride, silicon nitride and aluminum nitride. BRUTE Hydrazine generates ultra-thin films with low resistivity and minimal oxygen contamination.
BRUTE® Peroxide
BRUTE Peroxide is an alternative to ozone and water in ALD applications requiring low-temperature, high-quality oxide films. It can also replace O2 plasma for surface preparation in wafer bonding, specialty coatings, and area selective deposition.
Peroxidizer®
The Peroxidizer continuously converts liquid hydrogen peroxide into hydrogen peroxide gas. H2O2 gas has a myriad of applications for next generation devices. The Peroxidizer can be used for gapfill cure, anneal, atomic layer deposition, PR/ARC pre-treatment and more. For high flows of hydrogen peroxide gas, the Peroxidizer is cost effective for HVM applications.
Upcoming Events
International ALD/ALE
June 22-25, 2025
Jeju Island, South Korea
About RASIRC
Founded in 2005, RASIRC uses proprietary technology to generate high purity vapor from liquid sources. ISO 9001-2008 certified, RASIRC develops and manufactures products in California and Colorado targeted at low temperature surface modification and thin film growth.