RASIRC
White Papers/
Technical Presentations
Research results and technical details
Comparative Study of Titanium Nitride ALD using High Purity Hydrazine vs Ammonia
Daniel Alvarez, PhD
HYDRAZINE
OCTOBER 2020
Low Temperature Crystalline AlN ALD with Hydrazine
Professor Andrew C. Kummel (UCSD)
HYDRAZINE
JUNE 2020
Advantages of Hydrogen Peroxide in Spacer and Hard Mask ALD
Daniel Alvarez, PhD
PEROXIDIZER
MARCH 2020
Hydrogen Peroxide Gas Delivery for Atomic Layer Deposition, Annealing, and Surface Cleaning in Semiconductor Processing
Jeffrey Spiegelman, Russ Holmes and Zohreh Shamsi
PEROXIDIZER
JUNE 2016
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Anhydrous Hydrogen Peroxide Gas Delivery for Atomic Layer Deposition
Daniel Alvarez, Jr., Jeffrey Spiegelman
BRUTE PEROXIDE
FEBRUARY 2016
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Particle Generation by Incomplete Vaporization of Condensable Fluids and Particle Prevention by Membrane Pervaporation
Jeffrey Spiegelman, Daniel Alvarez, Russ Holmes
RAINMAKER HUMIDIFICATION SYSTEM (RHS)
JUNE 2016
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Process Variables Affecting Silicon Oxide Films Related to Wet Thermal Oxidation
Jeffrey Spiegelman
RAINMAKER HUMIDIFICATION SYSTEM (RHS)
MAY 2008
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Low temperature thermal SiNx ALD process using N2H4
Jae Chan Park, Dae Hyun Kim, Tae Jun Seok, Dae Woong Kim, Woo-Hee Kim and Tae Joo Park
HYDRAZINE
2018
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Low-T Thermal ALD BN from N2H4 + BCI3 on SI0.7Ge0.3(001), HPOG, and Cu
Steven Wolf, M. Breeden, M. Edmonds, K
HYDRAZINE
2018
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Low temperature Aluminium Nitride Deposition: Comparing Hydrazine and Ammonia
Aswin L.N. Kondusamy, Su Min Hwang, Zhiyang Qin, Antonio T. Lucero, Xin Meng, Dan Alvarez Jr., Jeff Spiegelman, Jiyoung Kim
HYDRAZINE
2019
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AS-TuP4 Investigation of In-situ Surface Cleaning of Cu Films using O3/O2 and N2H4
Su Min Hwang, A.L.N. Kondusamy, Q. Zhiyang, H.S. Kim, L.F. Peña, K. Tan, J. Veyan, Daniel Alvarez, Jeffrey Spiegelman, Jiyoung Kim
HYDRAZINE
2019
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Low Temperature Atomic Layer Deposition of Silicon Nitride using Hexachlorodisilane and Ultra-High Purity Hydrazine
Aswin L. N. Kondusamy, Antonio T. Lucero, Su Min Hwang, Xin Meng, Harrison S. Kim, Dan Alvarez Jr., Jeff Spiegelman, and Jiyoung Kim
HYDRAZINE
2018
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Low Temperature Thermal ALD TiNx and TaNx Films from Anhydrous N2H4
Steven Wolf, Michael Breeden, Mahmut Kavrik, Jun Hong Park, Russell Holmes, Daniel Alvarez, Jeffrey Spiegelman, and Andrew C. Kummel
HYDRAZINE
2018
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Low temperature thermal ALD of a SiNx interfacial diffusion barrier and interface passivation layer on SixGe1- x(001) and SixGe1- x(110)
Mary Edmonds, Kasra Sardashti, Steven Wolf, Evgueni Chagarov, Max Clemons, Tyler Kent, Jun Hong Park, Kechao Tang, Paul C. McIntyre, Naomi Yoshida, Lin Dong, Russell Holmes, Daniel Alvarez, and Andrew C. Kummel
HYDRAZINE
2017
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DFT Molecular Dynamics Simulations and Experimental Measurements of a-HfO2/a-SiO/SiGe(001) and a-HfO2/a-SiO2/SiGe(001) Interfaces
E. Chagarov, K. Sardashti, I. Kwak, S. Ueda, Andrew C. Kummel, M. Yakimov, S. Oktyabrsky, N. Yoshida, L. Dong. N. Kim, S. Nemani, Daniel Alvarez, Jeffrey Spiegelman
BRUTE PEROXIDE, PEROXIDIZER
2016
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Atomic imaging and modeling of passivation, functionalization, and atomic layer deposition nucleation of the SiGe(001) surface via H2O2(g) and trimethylaluminum dosing
Tobin Kaufman-Osborn, Evgueni A. Chagarov, SangWook Park, Bhagawan Sahuc, Shariq Siddiqui, Andrew C. Kummel
BRUTE PEROXIDE, PEROXIDIZER
2014
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Self-limiting CVD of a passivating SiOx control layer on InGaAs(001)-(2×4) with the prevention of III-V oxidation
Mary Edmonds, Steven Wolf, Evgueni Chagarov, Tyler Kent, Jun Hong Park, Russell Holmes, Daniel Alvarez, Ravi Droopad, Andrew C. Kummel
BRUTE PEROXIDE, PEROXIDIZER
2017
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Vapor-phase Surface Cleaning of Electroplated Cu Films Using Anhydrous N2H4
Su Min Hwang, Luis Fabián Peña, Kui Tan, Harrison Sejoon Kim, Aswin L. N. Kondusamy, Zhiyang Qin, Yong Chan Jung, Jean-Francois Veyan, Daniel Alvarez, Jeff Spiegelman, and Jiyoung Kim
HYDRAZINE
2019
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Cleaning and passivation of Copper Surface using acetic acid, hydrazine and self-assembled monolayers
Su Min Hwang, Harrison Sejoon Kim, Jin-Hyun Kim, Yong Chan Jung, Luis Fabián Peña, Kui Tan, Jean-Francois Veyan, Daniel Alvarez, Jeff Spiegelman, Dennis M. Hausmann, Kashish Sharma, Paul Lemaire, and Jiyoung Kim
HYDRAZINE
2019
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Low Resistance ALD TiNx from Low Temperature Thermal TiCl4 + Anhydrous N2H4
Steven Wolf, M. Kavrik, S. Ueda, M. Breeden1 J. Park, R. Holmes, Daniel Alvarez, Jeffrey Spiegelman, and Andrew C. Kummel
HYDRAZINE
2019
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RASIRC BRUTE Hydrazine versus Ammonia for III-V Nitride Deposition
Daniel Alvarez, PhD
HYDRAZINE
JUNE 2020
Sacrificial hardmask ALD with hydrogen peroxide: comparative study of low temperature growth and film characteristics for TiO2 and Al2O
Dr. Daniel Alvarez, Keisuke Andachi, Gaku Tsuchibuchi, Katsumasa Suzuki, Jeff Spiegelman
PEROXIDIZER
FEBRUARY 2020
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BRUTE Hydrazine for Low Temperature Metal-Nitride ALD: Low Resistivity and Oxygen-Free Films Enabled by Ultra-High Purity
Daniel Alvarez and Jeffrey Spiegelman
BRUTE HYDRAZINE
2017
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Low temperature Aluminium Nitride Deposition: Comparing Hydrazine and Ammonia
Aswin L.N. Kondusamy, Su Min Hwang, Zhiyang Qin, Antonio T. Lucero, Xin Meng, Dan Alvarez Jr., Jeff Spiegelman, Jiyoung Kim
HYDRAZINE
2019
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Decomposition of Hydrogen Peroxide in the Gas Phase
Jeff Spiegelman
PEROXIDIZER, BRUTE PEROXIDE, HYDROGEN PEROXIDE
MARCH 2019
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Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor
Daniel Alvarez and Jeffrey Spiegelman
PEROXIDIZER, BRUTE PEROXIDE, HYDROGEN PEROXIDE
JAN/FEB 2015
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RainMaker Humidification System for Precise Delivery of Water Vapor into Atmospheric and Vacuum Application
Jeffrey Spiegelman
RAINMAKER HUMIDIFICATION SYSTEM (RHS)
MAY 2008
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ALD TiN Evaluation Using BRUTE Hydrazine
Electronics Technology Dept., Tsukuba Laboratories, Research & Development Div., RASIRC and Taiyo Nippon Sanso
HYDRAZINE
2020
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AF2-MoP16 ALD HfO2 with Anhydrous H2O2 in a 300 mm Cross-flow Reactor – Comparison with H2O and O3 Oxidants
Steven Consiglio, R. Clark, C. Wajda, G. Leusink
BRUTE PEROXIDE, PEROXIDIZER
2019
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Investigation of Low Temperature Silicon Nitride Deposition using Hexachlorodisilane and Ultra-High Purity Hydrazine
Antonio T. Lucero, Aswin Kondusamy, Su Min Hwang, Xin Meng, Harrison S. Kim, Dan Alvarez Jr., Jeff Spiegelman, and Jiyoung Kim
HYDRAZINE
2020
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Deposition of High Thermal Conductivity AlN Heat Spreader Films
Scott T. Ueda, Aaron McLeod, and Andrew C. Kummel, Chris Perez, Michelle Chen, and Eric Pop
HYDRAZINE
2020
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ALD of Al2O3 using H2O2 Vapor
Adam Hinckley, Pablo Mancheno, and Anthony Muscat
BRUTE PEROXIDE, PEROXIDIZER
2015
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Passivation and Functionalization of SiGe(001) and (110) via HOOH(g) Dosing for ALD Nucleation
Sang Wook Park, Tobin Kaufman-Osborn, Hyonwoong Kim, Evgueni Chagarov, Bhagawan Sahu, Andrew C. Kummel
BRUTE PEROXIDE, PEROXIDIZER
2014
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Comparison of hydrogen peroxide and ozone for use in zirconium oxide atomic layer deposition
Daniel Alvarez, Jeffrey Spiegelman
BRUTE PEROXIDE, PEROXIDIZER
2019
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Anhydrous H2O2 for ALD HfO2 growth and interfacial layer thickness control
S. Consiglio, R. D. Clark, T. Hakamata, K. Tapily. C. S. Wajda, and G. J. Leusink
HYDRAZINE
2016
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Low temperature ALD of SiNx in trench structure: Comparing hollow cathode plasma-enhanced ALD and thermal ALD with hydrazine
Aswin L.N. Kondusamy, Su Min Hwang, Zhiyang Qin, Antonio T. Lucero, Xin Meng, Harrison S. Kim, Jaebeom Lee, Dan Alvarez Jr., Jeff Spiegelman, Jiyoung Kim
HYDRAZINE
2019
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Low Temperature ALD of SiNx using Si2Cl6 and ultra high-purity Hydrazine
Aswin L.N. Kondusamy, Antonio T. Lucero, Su Min Hwang, Xin Meng, Harrison S. Kim, Jaebeom Lee, Dan Alvarez Jr., Jeff Spiegelman, Jiyoung Kim
HYDRAZINE
2018
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Effect of Vapor-phase Cleaning Using Anhydrous N2H4 on Cu and Co for Area-Selective Atomic Layer Deposition
Jin-Hyun Kim,a,b Sang Woo Kim, Su Min Hwang, Harrison Sejoon Kim, Yong Chan Jung, Luis Fabián Peña, Kui Tan, Jean-Francois Veyan, Rino Choi, Daniel Alvarez, Jeff Spiegelman, and Jiyoung Kim
HYDRAZINE
2020
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Nafion-based Drying Apparatuses for Humidity Removal from Sample Gas Prior to GC/MS Analysis
Chris Ramos, Russell Holmes, Daniel Alvarez and Jeffrey Spiegelman
BRUTE PEROXIDE, BRUTE HYDRAZINE
2013
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