Anhydrous Hydrogen Peroxide Gas in Precursor Format
BRUTE® Peroxide is more reactive than water vapor or ozone
RASIRC BRUTE Peroxide Benefits
- Provides H2O2 gas with minimal water
- Differentiates between H2O2 and water in process reactions
- Reacts faster and at lower temperatures than water
- Removes carbon and hydroxylates interface surfaces
- Improves compatibility with metal surfaces—less aggressive oxidant than ozone or O2 Plasma
- Superior penetration into 3D high aspect ratio microstructures
- Allows high concentration H2O2 delivery into vacuum and low pressure applications
- Increases interface hydroxyl density on Si, Ge and SiGe films
- Enables in situ cleaning without liquid
- Proprietary delivery process, ensuring higher purity
RASIRC products generate and deliver water vapor, hydrogen peroxide and hydrazine gas in controlled, repeatable concentrations to critical processes.
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