Low Resistivity Titanium Nitride Thin Films ALD realized by RASIRC BRUTE® Hydrazine vaporization technology

December 17, 2020

Cheng-Hsuan Kuo and co-workers at UC San Diego in the Kummel research group, has recently concluded a study on TiN ALD utilizing the RASIRC BRUTE® Hydrazine (N2H4) vaporizer technology, which is presented this week at IEEE SISC December 16-18. Read the study here.