Silicon Nitride ALD Process Using High Purity Hydrazine for Low Temperature Deposition

July 18, 2023
Chart showing Wet Etch Rate (WER)

Bellevue, Washington – July 23rd to 26th, 2023 – Leading experts in the field of atomic layer deposition (ALD) are gathering in Bellevue, Washington for the AVS 23rd International Conference on Atomic Layer Deposition (ALD 2023). Among the cutting-edge research being presented at the conference, is the poster titled “Silicon Nitride ALD Process Using High Purity Hydrazine for Low Temperature Deposition”.