Resources

White papers, technical presentations, and research results

Filter Resources

Feb 2016

Anhydrous Hydrogen Peroxide Gas Delivery for Atomic Layer Deposition

Author(s): Daniel Alvarez, Jr., Jeffrey Spiegelman

Products
,

Applications

Films

Jun 2015

ALD of Al2O3 using H2O2 Vapor

Author(s): Adam Hinckley, Pablo Mancheno, and Anthony Muscat

Products
,

Applications

Films

Jan 2015

Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

Author(s): Daniel Alvarez and Jeffrey Spiegelman

Products
,

Applications
,

Jun 2014

Atomic imaging and modeling of passivation, functionalization, and atomic layer deposition nucleation of the SiGe(001) surface via H2O2(g) and trimethylaluminum dosing

Author(s): Tobin Kaufman-Osborn, Evgueni A. Chagarov, SangWook Park, Bhagawan Sahuc, Shariq Siddiqui, Andrew C. Kummel

Products

Applications
,

Films

Jun 2014

Passivation and Functionalization of SiGe(001) and (110) via HOOH(g) Dosing for ALD Nucleation

Author(s): Sang Wook Park, Tobin Kaufman-Osborn, Hyonwoong Kim, Evgueni Chagarov, Bhagawan Sahu, Andrew C. Kummel

Products

Applications
,

Films

Sep 2013

Nafion-based Drying Apparatuses for Humidity Removal from Sample Gas Prior to GC/MS Analysis

Author(s): Christopher Rosemeyer, Russel J. Holmes, Daniel Alvarez, Jr., Jeffrey Spiegelman

Jun 2009

Comparison of hydrogen peroxide and ozone for use in zirconium oxide atomic layer deposition

Author(s): Daniel Alvarez, Jeffrey Spiegelman

Products
,

Applications

Films

Jun 2009

Thermal Oxidation as a Key Technology for High Efficiency Screen Printed Industrial Silicon Solar Cells

Author(s): Daniel Biro, Sebastian Mack, Andreas Wolf, Anke Lemke, Udo Belledin, Denis Erath, Benedikt Holzinger, Edgar Allan Wotke, Marc Hofmann, Luca Gautero, Jochen Rentsch, Ralf Preu

Applications

May 2008

Process Variables Affecting Silicon Oxide Films Related to Wet Thermal Oxidation

Author(s): Jeffrey Spiegelman

Applications

Films