Low temperature thermal SiNx ALD process using N2H4

Jae Chan Park, Dae Hyun Kim, Tae Jun Seok, Dae Woong Kim, Woo-Hee Kim and Tae Joo Park

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June 2018

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Products:
Brute Hydrazine

Applications:
ALD (Oxide/Nitride)

Films:
Si3N4