Low Temperature Atomic Layer Deposition of Silicon Nitride using Hexachlorodisilane and Ultra-High Purity Hydrazine

Aswin L. N. Kondusamy, Antonio T. Lucero, Su Min Hwang, Xin Meng, Harrison S. Kim, Dan Alvarez Jr., Jeff Spiegelman, and Jiyoung Kim

Get full report
Back to all Resources

All Resources

June 2018

Get the full research report

Enter your email to request the full PDF of this report.

Resource Request

This field is for validation purposes and should be left unchanged.

Products:

Applications:

Films: