Aswin L.N. Kondusamy, Antonio T. Lucero, Su Min Hwang, Xin Meng, Harrison S. Kim, Jaebeom Lee, Dan Alvarez Jr., Jeff Spiegelman, Jiyoung Kim
Products: BRUTE Hydrazine
Applications: ALD (Oxide/Nitride)
Films: Si3N4
All Resources
June 2018