Effect of Vapor-phase Cleaning Using Anhydrous N2H4 on Cu and Co for Area-Selective Atomic Layer Deposition

Jin-Hyun Kim,a,b Sang Woo Kim, Su Min Hwang, Harrison Sejoon Kim, Yong Chan Jung, Luis Fabißn Pe±a, Kui Tan, Jean-Francois Veyan, Rino Choi, Daniel Alvarez, Jeff Spiegelman, and Jiyoung Kim

Get full report
Back to all Resources

All Resources

June 2020

Get the full research report

Enter your email to request the full PDF of this report.

Resource Request

This field is for validation purposes and should be left unchanged.

Products:

Applications:
,

Films:
,