RASIRC Demonstrates Hydrogen Peroxide/Water Results in Highest Quality Growth and Film Characteristics for Metal-Oxide Dielectric ALD

October 13, 2019

RASIRC will present a metal-oxide dielectric ALD comparative study that examines growth and film characteristics for H2O2/H2O mixtures, H2O and ozone at ECS Meeting held in Atlanta, Georgia October 13-17. The presentation will review common precursor chemistries and discuss collaborative research on oxidants, specifically hydrogen peroxide reactivity.