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BRUTE® Hydrazine
BRUTE Hydrazine converts liquid hydrazine into pure, dry hydrazine gas. BRUTE Hydrazine is highly effective source for surface reduction and growth of low temperature nitride ALD and MOCVD. Commercial applications include titanium nitride, silicon nitride and aluminum nitride. BRUTE Hydrazine generates ultra-thin films with low resistivity and minimal oxygen contamination.
BRUTE® Peroxide
BRUTE Peroxide can be used for surface functionalization, surface passivation and area selective deposition. BRUTE Peroxide delivers a dense hydroxylated surface with minimal sub-surface oxidation. Think Brute Peroxide instead of water, ozone, or oxygen
plasma maximum hydroxyls.
Peroxidizer®
The Peroxidizer continuously converts liquid hydrogen peroxide into hydrogen peroxide
gas. H2O2 gas has a myriad of applications for next generation devices. The Peroxidizer can be used for gapfill cure, anneal, atomic layer deposition, PR/ARC pre-treatment and more. For high flows of hydrogen peroxide gas, the Peroxidizer is cost
effective for HVM applications.