Ultra-Dry Hydrazine Gas for Low Temperature Nitrides
Brute® Hydrazine Gas: Reducing Agent and Nitride Source
Low Temperature, High Aspect Ratio
Hydrazine is an excellent low temperature thermal ALD nitride source. Next generation devices have low thermal budgets and high aspect ratio structures that create new challenges for conformal III-V nitride films. Old solutions cannot meet these new challenges. Nitrogen from ammonia does not yield quality films below 400°C. Plasma delivery does not uniformly coat internal side walls of high aspect ratio structures and causes surface damage.
Advantages of Hydrazine Gas
- Highly reactive, enabling thermal ALD at much less than 400°C
- No line of sight required, providing uniform films on high aspect ratio structures
- No oxygen or carbon, eliminating contamination
- Fewer device defects
- Better electrical performance
Get Independent Research Results
Latest News
Record Low Resistivity Titanium Nitride Film Fabricated by Thermal ALD – Ultra-dry hydrazine enables growth at low temperature
Authored by researchers from UCSD, Samsung, and RASIRC
PUBLISHED JANUARY 18, 2022
The Emergence of Hydrazine (N2H4) in Semiconductor Applications
Daniel Alvarez and Jeffrey Spiegelman
HYDRAZINE 2022
RASIRC products generate and deliver water vapor, hydrogen peroxide and hydrazine gas in controlled, repeatable concentrations to critical processes.
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