RASIRC announced that it will be presenting “Hydrogen Peroxide Gas: From R&D to HVM” at the 7th Annual CMC Conference. The presentation will discuss the development of two technologies for hydrogen peroxide gas delivery that have crossed the chasm to high volume manufacturing.
“New oxidants are needed to address shrinking device size and continuously increasing three dimensional structures for NAND and DRAM,” said RASIRC Founder and CEO Jeffrey Spiegelman. “These oxidants must overcome line of sight limitations of plasma, temperature limits of water and oxygen, and film damage associated with Ozone.”