RASIRC Survey of Hydrazine (N2H4) in Semiconductor Applications Shows Growing Activity in Thin Films at Low Temperature

February 22, 2022

RASIRC today published a survey of semiconductor and related applications that use hydrazine gas.  The growing interest in hydrazine is driven by a need for new metals and metal nitride films that meet lower thermal budgets and shrinking 3-dimensional structures.  A new formulation of hydrazine meets these requirements.