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RASIRC
  • Products
    • BRUTE Hydrazine
    • BRUTE Peroxide
    • Peroxidizer
  • Applications
    • Oxides
    • Nitrides
  • Resources
    • Technical Resources
    • ALD Oxide Wizard
    • ALD Nitride Wizard
    • Research Partners
  • About
    • About RASIRC
    • Our Team
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SiO2

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  • SiO2
Apr 2024

Inhibitor Free Area Selective Atomic Layer Deposition (AS-ALD) of dielectric materials on Cu surface for Interconnect applications

Products
Brute Hydrazine

Applications
ALD (Oxide/Nitride), Area Selective Atomic Layer Deposition (ASD), Surface Clean / Modification

Films
Cu, SiO2

Apr 2024

Vapor Phase surface cleaning of Cobalt for novel interconnect applications

Products
Brute Hydrazine

Applications
ALD (Oxide/Nitride), Area Selective Atomic Layer Deposition (ASD), Surface Clean / Modification

Films
Cu, SiO2

May 2008

Process Variables Affecting Silicon Oxide Films Related to Wet Thermal Oxidation

Author(s): Jeffrey Spiegelman

Applications
Thermal Oxidation

Films
SiO2

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