RASIRC Chief Technology Officer Dr. Daniel Alvarez, Jr. will present at the upcoming SPIE Advanced Lithography conference Advances in Patterning Materials and Processes XXXVII held in San Jose, California on February 23-27, 2020. The presentation “Sacrificial hardmask ALD with hydrogen peroxide: comparative study of low temperature growth and film characteristics for TiO2 and Al2O3,” is part of Session 7: Deposition-based Patterning scheduled February 26 at 9:00 AM in Grand Ballroom 220C of the San Jose Convention Center.