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Poster highlighting that RASIRC is a gold sponsor of the 2019 ALD conference.

RASIRC Showcases Ultimate Oxidant and Nitride Precursors at Annual ALD Conference

Daniella Knelman / July 22, 2019

RASIRC Utilizes Novel Safe Hydrazine Delivery System to Enable Low Temperature Group III Metal-Nitride Deposition

Daniella Knelman / July 8, 2019

RASIRC Demonstrates Superior Titanium Dioxide Films by Use of Hydrogen Peroxide Gas

Daniella Knelman / June 20, 2019

A Japanese building with a crowd of people standing in front of it.

RASIRC Enables Low Temperature Group III Metal-Nitride Deposition

Daniella Knelman / May 15, 2019

RASIRC Releases White Paper on Minimizing BRUTE® Peroxide Decomposition

Daniella Knelman / April 23, 2019

A poster for the EFDS workshop, featuring a picture of the city of Berlin.

RASIRC Presents Process Control ‘Ins and Outs’ for Optimized Mass Delivery

Daniella Knelman / March 14, 2019

A chart that shows TiNx grown with Brute Hydrazine at 300°C gives comparable resistivity to TiNx grown with NH3 at 400°C.

Effective Silicon and Metal Nitride Deposition at Reduced Temperature

Daniella Knelman / November 15, 2018

RASIRC Presents New Oxidant Options for Low Temperature Dielectric ALD

Daniella Knelman / October 18, 2018

RASIRC Presents Results of Silicon Nitride Deposition Study at AiMES Conference

Daniella Knelman / September 30, 2018

RASIRC low temperature ALD of silicon and metal nitrides

Daniella Knelman / July 27, 2018

RASIRC in collaboration with The University of Texas, Dallas has recently developed a low temperature thermal ALD process using the

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