RASIRC Presents Alternative Method for Aperture Oxidation in VCSELs
RASIRC announced today that the company will present at VCSEL Day 2018, held April 12-13, 2018 in Ulm, Germany.
Uncategorized
Uncategorized
RASIRC Turns Thermal Mass Flow Measurement of Dilute Reactive Gas Species Inside Out
The presentation will discuss the importance of precursor gas flow measurement independent of carrier gas flow and will provide experimental
Uncategorized
RASIRC to present New ALD chemistries for low temperature oxide and nitride films at ALD4Industry
We are very happy to announce that have received a late news abstract from RASIRC out of San Diego, USA,
Uncategorized
Grow Low Temperature Nitrides by Atomic Layer Deposition Without Plasma
Unique Hydrazine formulation and package enables HAR and 3D film studies for Laboratories. Read the full article here.
Uncategorized
RASIRC BRUTE peroxide and hydrazine technology for leading edge memory and high performance logic
Hydrogen peroxide (H2O2) gas is an oxidant that improves passivation and nucleation density at semiconductor interfaces, potentially leading to reduced
Uncategorized
Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing
Hydrogen Peroxide Gas (HPG) is a powerful and versatile oxidant for processing new materials and 3D structures. HPG is now
Uncategorized
Rocket Fuel may Propel Moore’s Law
Jonas Sundqvist, co-chair of the CMC 2016, while working with Fraunhofer (fraunhofer.de) showed that hydrazine and it’s derivatives provide unique
Uncategorized
MATHESON Acquires Majority Share of RASIRC
RASIRC to continue developing products that purify and deliver ultra pure chemistries.