Author name: Daniella Knelman

RASIRC announced today that the company will present at VCSEL Day 2018, held April 12-13, 2018 in Ulm, Germany.

The presentation will discuss the importance of precursor gas flow measurement independent of carrier gas flow and will provide experimental

We are very happy to announce that have received a late news abstract from RASIRC out of San Diego, USA,

Unique Hydrazine formulation and package enables HAR and 3D film studies for Laboratories. Read the full article here.

Hydrogen peroxide (H2O2) gas is an oxidant that improves passivation and nucleation density at semiconductor interfaces, potentially leading to reduced

Hydrogen Peroxide Gas (HPG) is a powerful and versatile oxidant for processing new materials and 3D structures. HPG is now

Jonas Sundqvist, co-chair of the CMC 2016, while working with Fraunhofer (fraunhofer.de) showed that hydrazine and it’s derivatives provide unique

RASIRC to continue developing products that purify and deliver ultra pure chemistries.