Mission & Vision
RASIRC transforms liquids into dynamic vapors that enable innovations in semiconductor and adjacent markets. These reactive chemicals are essential materials for atomic scale processing, where atomic films must be grown at very low temperatures and in high aspect ratio structures.
Our History
RASIRC was founded in 2005 by Jeffrey Spiegelman, a serial entrepreneur with a successful history in the semiconductor equipment space.
The initial goal of RASIRC was to develop water vapor purification and delivery technology for oxidation in semiconductor and microelectronics device fabrication. The first product was installed in 2006 and over 100 systems were installed within the next 4 years.
Other products and patented technologies were quickly developed and brought to marketing including RainMaker Humidity System (RHS®) in 2007, hydrogen peroxide vaporizer (SVD) in 2012, high concentration Hydrogen Peroxide Gas in water vapor (Peroxidizer®) in 2013), anhydrous hydrogen peroxide gas (Brute Peroxide®) in 2014 and anhydrous hydrazine gas (Brute Hydrazine®) in 2015.
In 2012, RASIRC became ISO 9001-2008 certified. In 2022, Taiyo Nippon Sanso Corporation became an equity investor which increased RASIRC's ability to support global customers worldwide.
RASIRC continues to develop liquid to gas generation solutions for new molecules and new markets. Stay tuned for continued innovations.